t-Amylimidotris(dimethylamido)niobium, (NtAm)(NMe2)3Nb, CAS# 0-0-0
Plasma Enhanced Atomic Layer Deposition Film Publications
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|1||Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors|