(HFAC)Cu(VTMOS), hexafluoroacetylacetonato copper vinyltrimethoxysilane, CAS# 0-0-0
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor|