Introducing Plasma ALD, LLC's first in-house product. An economical, compact inductively coupled plasma source. Ideal for: Plasma-Enhanced Atomic Layer Deposition Thin Film Etch Surface cleaning Surface modification Contact us for more information.

Sb(cyclo-NC₂H₄)₃, Tris(aziridinyl) antimony (III) , CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

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