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Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
Co(TMHD)2, Co(THD)2, bis(2,2,6,6-tetramethyl-3,5-heptanedionato) cobalt(II), Cobalt dipivaloylmethanate, CAS# 13986-53-3
Where to buy
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | EpiValence | 🇬🇧 | Cobalt tetramethylheptanedionate |
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Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.