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Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
Self-limiting diamond growth from alternating CFx and H fluxes
Sub-10-nm ferroelectric Gd-doped HfO2 layers
Co(TMHD)2, Co(THD)2, bis(2,2,6,6-tetramethyl-3,5-heptanedionato) cobalt(II), Cobalt dipivaloylmethanate, CAS# 13986-53-3
Where to buy
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | EpiValence | 🇬🇧 | Cobalt tetramethylheptanedionate |
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Plasma Enhanced Atomic Layer Deposition Film Publications
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