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Introducing Plasma ALD, LLC's first in-house product. |
An economical, compact inductively coupled plasma source. |
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Ideal for: |
- Plasma-Enhanced Atomic Layer Deposition
- Thin Film Etch
- Surface cleaning
- Surface modification
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Contact us for more information. |
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Bi(C6H5)3, Triphenyl Bismuth, CAS# 603-33-8
Where to buy
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Plasma Enhanced Atomic Layer Deposition Film Publications
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