TASn, TetraAllylTin, (H2C=CHCH2)2Sn, CAS# 7393-43-3

Where to buy


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization