Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Contact Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Contact Resistance returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
2In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
3Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM