Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Critical Current Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Critical Current Density returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
2Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
3Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition