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Growth of ZnO nanorods on fluorine-doped tin oxide substrate without catalyst by radio-frequency magnetron sputtering

Type:
Journal
Info:
Thin Solid Films, Volume 573, 31 December 2014, Pages 79-83
Date:
2014-11-04
DOI:
http://dx.doi.org/10.1016/j.tsf.2014.11.010

Author Information

Name Institution
Myung YangSeoul National University

Films

Plasma SnO2

Hardware used: Unknown
Deposition Temperature = 300C

Film/Plasma Properties

Substrates

Silicon
SiO2

Notes

255