Schottky Barrier Height Reduction at Interface Between GZO Transparent Electrode and InP/InGaAs Structure by Zinc Driven-in Step and Nickel Oxide Insertion

Type:
Journal
Info:
IEEE Electron Device Letters (Volume:35, Issue: 12)
Date:
2014-10-14

Author Information

Name Institution
Yueh-Lin LeeNational Tsing Hua University

Films

Plasma Ga:ZnO

Hardware used: Unknown


Film/Plasma Properties

Substrates

Notes

PEALD Ga-doped ZnO as TCO electrode.
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