Plasma-Enhanced Atomic Layer Deposition of TaCx Films Using Tris(neopentyl) Tantalum Dichloride and H2 Plasma
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 14 (8) D89 (2011)
Date:
2011-05-06
Author Information
| Name | Institution |
|---|---|
| Tae-Ho Kim | Yeungnam University |
| Tae-Kwang Eom | Yeungnam University |
| Soo-Hyun Kim | Yeungnam University |
| Dae-Hwan Kang | Samsung Electronics Co. |
| Hoon Kim | Applied Materials |
| Sangho Yu | Applied Materials |
| Jin Mook Lim | DNF Co. Ltd. |
Films
Film/Plasma Properties
Substrates
Notes
| 1729 |