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Plasma-Enhanced Atomic Layer Deposition of TaCx Films Using Tris(neopentyl) Tantalum Dichloride and H2 Plasma

Type:
Journal
Info:
Electrochemical and Solid-State Letters, 14 (8) D89 (2011)
Date:
2011-05-06
DOI:
http://dx.doi.org/10.1149/1.3594747

Author Information

Name Institution
Tae-Ho KimYeungnam University
Tae-Kwang EomYeungnam University
Soo-Hyun KimYeungnam University
Dae-Hwan KangSamsung Electronics Co.
Hoon KimApplied Materials
Sangho YuApplied Materials
Jin Mook LimDNF Co. Ltd.

Films

Film/Plasma Properties

Substrates

Notes

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