Publication Information

Title: Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure

Type: Journal

Info: J. Mater. Chem. C, 2014, 2, 7570

Date: 2014-07-11

DOI: http://dx.doi.org/10.1039/c4tc00849a

Author Information

Name

Institution

Xi'an Jiaotong University

Xi'an Jiaotong University

Xi'an Jiaotong University

Xi'an Jiaotong University

Xi'an Jiaotong University

Xi'an Jiaotong University

Xi'an Jiaotong University

Xi'an Jiaotong University

Films

Plasma Graphene using Picosun R200

Deposition Temperature Range N/A

71-43-2

1333-74-0

7440-37-1

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

FEI Titan G2

Thickness

Raman Spectroscopy

Horiba Jobin Yvon R800

Chemical Composition, Impurities

ELS, EELS, Electron Energy Loss Spectroscopy

FEI Titan G2

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Electron Diffraction

JEOL 2100

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

FEI Quanta 250 FEG

Substrates

Cu

Keywords

Graphene

PEALD Film Development

Notes

112

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