Ar, Argon, CAS# 7440-37-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
2AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
3Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
4Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
5Plasma enhanced atomic layer deposition of aluminum sulfide thin films
6Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
7Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
8Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
9Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
10Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
11Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
12Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
13Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
14Room temperature atomic layer deposition of TiO2 on gold nanoparticles
15Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
16Plasma enhanced atomic layer deposition of zinc sulfide thin films
17Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon


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