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Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Applied Surface Science 425 (2017) 781 - 787
Date:
2017-06-23
Author Information
| Name | Institution |
|---|---|
| Kangsik Kim | Ulsan National Institute of Science and Technology |
| Il-Kwon Oh | Yonsei University |
| Hyungjun Kim | Yonsei University |
| Zonghoon Lee | Ulsan National Institute of Science and Technology |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Strain
Analysis: HAADF, High-Angle Annular Dark Field
Characteristic: Interfacial Layer
Analysis: HAADF, High-Angle Annular Dark Field
Characteristic: Chemical Composition, Impurities
Analysis: ARXPS, Angle Resolved X-ray Photoelectron Spectroscopy
Characteristic: Damage, Defects
Analysis: -
Substrates
| Silicon |
Notes
| Compares 13.56MHz and 60MHz plasma sources. |
| 1519 |