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Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
Type:
Conference Proceedings
Info:
Mat. Res. Soc. Symp. Proc. Vol. 811
Date:
2004-01-01
Author Information
| Name | Institution |
|---|---|
| Xinye Liu | Genus, Inc. |
| Sasangan Ramanathan | Genus, Inc. |
| Eddie Lee | Genus, Inc. |
| Thomas E. Seidel | Genus, Inc. |
Films
Thermal AlN
Plasma AlN
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Uniformity
Analysis: Ellipsometry
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Substrates
| Silicon |
Notes
| 1161 |