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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

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Kurt J Lesker ALD-150LX Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Kurt J Lesker ALD-150LX hardware returned 22 records.

NumberTitle
1Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
2A route to low temperature growth of single crystal GaN on sapphire
3Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
4Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
5Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
6High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
7Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
8Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
9Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
10Atomic Layer Deposition of Nanolayered Carbon Films
11Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
12Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
13Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
14Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
15Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
16Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
17Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
18Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
19Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
20Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
21Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
22AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms