TMS, Trimethylsilane, (CH3)3SiH, Me3SiH, CAS# 993-07-7

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.Trimethylsilane, 97%

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
2Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition