Search 1628 plasma ALD publications by:
TMS, trimethylsilane, Me3SiH, CAS# 993-07-7
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|1||Strem Chemicals, Inc.||Trimethylsilane, 97%|
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Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition|
|2||Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition|