Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



La(TMHD)3, La(THD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) lanthanum, Lanthanum dipivaloylmethanate, CAS# 14319-13-2

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanum(III), 99% (99.9%-La) [La(TMHD)3]
2Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(2,2,6,6-tetramethylheptane-3,5-dionato)lanthanum
3EreztechπŸ‡ΊπŸ‡Έ2,2,6,6-Tetramethyl-3,5-heptanedionate lanthanum(III)
4GelestπŸ‡ΊπŸ‡ΈLanthanum 2,2,6,6-Tetramethyl-3,5-Heptanedionate

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
2Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application