Search 1616 plasma ALD publications by:
La(TMHD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) lanthanum, CAS# 14319-13-2
Where to buy
|3||Strem Chemicals, Inc.||Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanum(III), 99% (99.9%-La) [La(TMHD)3]|
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Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition|
|2||Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application|