Bis(dimethylaminomethylsilyl)(trimethylsilyl)amine, Me3SiN(SiHMeNMe2)2, (CH3)3SiN(SiH(CH3)N(CH3)2)2, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

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1Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
2Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer