The publication database currently has 1636 entries.
203 Films Compositions
274 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics
91 Theses
5041 Authors
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Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
Electron-enhanced atomic layer deposition of silicon thin films at room temperature
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Search 1636 plasma ALD publications by:
Tris N,N-bis(trimethylsilyl)amide yttrium (III), CAS# 41836-28-6
Where to buy
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | Strem Chemicals, Inc. | 🇺🇸 | Tris N,N-bis(trimethylsilyl)amide yttrium (III), min. 98% (99.9%-Y) (REO) |
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Plasma Enhanced Atomic Layer Deposition Film Publications
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