3DMAB, TDMAB, (Me2N)3B, (CH3)2N)3B, Tris(dimethylamido)borane, CAS# 4375-83-1

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
2Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon