Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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3DMAB, TDMAB, (Me2N)3B, (CH3)2N)3B, Tris(dimethylamido)borane, CAS# 4375-83-1

Informational Websites

NumberWebsite
1http://webbook.nist.gov/cgi/cbook.cgi?ID=4375-83-1
2https://pubchem.ncbi.nlm.nih.gov/compound/Tris_dimethylamino_borane#section=Top
3http://webbook.nist.gov/cgi/cbook.cgi?ID=C4375831&Mask=20

Where to buy

NumberVendorRegionLink
1Manchester Organics🇬🇧Tris(dimethylamino)borane
2Santa Cruz Biotechnology🇺🇸Tris(dimethylamido)borane (CAS 4375-83-1)
3Ereztech🇺🇸Tris(dimethylamino) borane
4Sigma-Aldrich, Co. LLC🇺🇸Tris(dimethylamino)borane 99%

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
2Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon