Work Function Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Work Function returned 21 record(s).

Number	Title
1	Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
2	Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
3	Plasma Enhanced Atomic Layer Deposition of TiC_xN_y Film with Various Reactive Gases
4	Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
5	Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO₂ gate stacks
6	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO₂
7	Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
8	Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
9	High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
10	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
11	The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
12	Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
13	Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
14	Al₂O₃ and SiO₂ Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
15	Work function tuning of plasma-enhanced atomic layer deposited WC_xN_y electrodes for metal/oxide/semiconductor devices
16	Atomic layer deposition of WN_x thin films using a F-free tungsten metal-organic precursor and NH₃ plasma as a Cu-diffusion barrier
17	Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
18	Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
19	Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
20	Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
21	Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN

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Work Function Plasma Enhanced Atomic Layer Deposition Publications