Work Function Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Work Function returned 21 record(s).

Number	Title
1	Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
2	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
3	High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
4	Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
5	Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
6	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
7	Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
8	Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
9	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
10	Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
11	Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
12	Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
13	Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
14	Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
15	Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
16	The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
17	Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
18	Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
19	Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
20	Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
21	Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks