Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


ESR, Equivalent Series Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing ESR, Equivalent Series Resistance returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
2ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications