Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy Diiodosilane, H2I2Si CAS# 13760-02-6

Diiodosilane, H2I2Si CAS# 13760-02-6 is available from the following source(s):

NumberVendorRegionLink
1DOCK/CHEMICALS🇩🇪Diiodosilane
2Yoodatech (Shanghai) Co., LtdDiiodosilane, H2I2Si - contact maggie@yoodatech.com

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