 |
Introducing Plasma ALD, LLC's first in-house product. |
An economical, compact inductively coupled plasma source. |
|
Ideal for: |
- Plasma-Enhanced Atomic Layer Deposition
- Thin Film Etch
- Surface cleaning
- Surface modification
|
Contact us for more information. |
|  |
Where to buy DADI, [Me2N(CH2)3]Me2In, (3-(dimethylamino)propyl)dimethylindium CAS# 120441-92-1
DADI, [Me2N(CH2)3]Me2In, (3-(dimethylamino)propyl)dimethylindium CAS# 120441-92-1 is available from the following source(s):
If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.