Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Where to buy DADI, [Me2N(CH2)3]Me2In, (3-(dimethylamino)propyl)dimethylindium CAS# 120441-92-1

DADI, [Me2N(CH2)3]Me2In, (3-(dimethylamino)propyl)dimethylindium CAS# 120441-92-1 is available from the following source(s):

NumberVendorRegionLink
1DOCK/CHEMICALS🇩🇪Dimethylaminopropyl-dimethyl-indium

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