Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy ZrCMMM, (MeCp)2Zr(OMe)(Me), Bis(methyl-η5-cyclopentadienyl)methoxymethyl zirconium CAS# 916597-01-8

ZrCMMM, (MeCp)2Zr(OMe)(Me), Bis(methyl-η5-cyclopentadienyl)methoxymethyl zirconium CAS# 916597-01-8 is available from the following source(s):

NumberVendorRegionLink
1Sigma-Aldrich, Co. LLC🇺🇸Bis(methyl-η5-cyclopentadienyl)methoxymethylzirconium, Synonym: ZRCMMM, ZrD-CO4
2Ereztech🇺🇸Bis(methyl-η5-cyclopentadienyl) methoxymethyl zirconium

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