Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy Tert-Butylimido,Tris(EthylMethylamino)Tantalum, Ta[N(CH3)(C2H5)]3[=NC(CH3)3], TBTEMT CAS# 511292-99-2

Tert-Butylimido,Tris(EthylMethylamino)Tantalum, Ta[N(CH3)(C2H5)]3[=NC(CH3)3], TBTEMT CAS# 511292-99-2 is available from the following source(s):

NumberVendorRegionLink
1DOCK/CHEMICALS🇩🇪(tert-butylimido)tris(ethylmethylamido)tantalum
2Strem Chemicals, Inc.🇺🇸(t-Butylimido)tris(ethylmethylamino)tantalum(V), (99.99%-Ta) PURATREM
3Pegasus Chemicals🇬🇧Tris(ethylmethylamido)(tert-butylimido)tantalum(V)
4Ereztech🇺🇸Tris(ethylmethylamido) (tert-butylimido) tantalum(V)

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