Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy Bis(EthylMethylAmino)Silane, BEMAS, (EtMeN)2SiH2 CAS# 1011514-41-2

Bis(EthylMethylAmino)Silane, BEMAS, (EtMeN)2SiH2 CAS# 1011514-41-2 is available from the following source(s):

NumberVendorRegionLink
1DOCK/CHEMICALS🇩🇪Bis(ethylmethylamino)silane
2Ereztech🇺🇸Bis(ethylmethylamino) silane

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