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Introducing Plasma ALD, LLC's first in-house product. |
An economical, compact inductively coupled plasma source. |
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Ideal for: |
- Plasma-Enhanced Atomic Layer Deposition
- Thin Film Etch
- Surface cleaning
- Surface modification
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Contact us for more information. |
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Where to buy Tris(dimethylamino)chlorosilane, 3DMASiCl CAS# 13307-05-6
Tris(dimethylamino)chlorosilane, 3DMASiCl CAS# 13307-05-6 is available from the following source(s):
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