Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy Co(TMHD)2, Co(THD)2, bis(2,2,6,6-tetramethyl-3,5-heptanedionato) cobalt(II), Cobalt dipivaloylmethanate CAS# 13986-53-3

Co(TMHD)2, Co(THD)2, bis(2,2,6,6-tetramethyl-3,5-heptanedionato) cobalt(II), Cobalt dipivaloylmethanate CAS# 13986-53-3 is available from the following source(s):

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