Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy (MeCp)W(CO)2(NO), methylcyclopentadienyl dicarbonyl nitrosyl tungsten CAS# 0-0-0

(MeCp)W(CO)2(NO), methylcyclopentadienyl dicarbonyl nitrosyl tungsten CAS# 0-0-0 is available from the following source(s):

NumberVendorRegionLink
1Ereztech🇺🇸(n5-methylcyclopentadienyl) dicarbonylnitrosyl tungsten

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