Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy TASn, TetraAllylTin, (H2C=CHCH2)2Sn CAS# 7393-43-3

TASn, TetraAllylTin, (H2C=CHCH2)2Sn CAS# 7393-43-3 is available from the following source(s):

NumberVendorRegionLink
1Alfa Aesar🇺🇸Tetraallyltin
2Sigma-Aldrich, Co. LLC🇺🇸Tetraallyltin
3TCI🇺🇸Tetraallyltin
4Ereztech🇺🇸Tetraallyltin
5Gelest🇺🇸Tetraallyltin

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