|1||Strem Chemicals, Inc.||Dimethylaluminum i-propoxide, 98% (99.99+%-Al)|
|2||EpiValence||Aluminium dimethyl isopropoxide|
|3||Alfa Chemistry||Dimethylaluminum i-propoxide|
|4||American Elements||Aluminum Dimethyl Isopropoxide|
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Your search for publications using this chemistry returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Al2O3||Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method|
|2||Al2O3||Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide|
|3||Al2O3||Fixed-Gap Tunnel Junction for Reading DNA Nucleotides|
|4||Al2O3||Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment|
|5||Al2O3||Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor|
|6||Al2O3||Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride|
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