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Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
Type:
Journal
Info:
Korean Journal of Chemical Engineering, December 2018, Volume 35, Issue 12, pp 2474-2479
Date:
2018-10-23
Author Information
| Name | Institution |
|---|---|
| Su-Hyeon Ji | Chonnam National University |
| Woo-Sung Jang | Chonnam National University |
| Jeong-Wook Son | Chonnam National University |
| Do-Heyoung Kim | Chonnam National University |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Silicon |
Notes
| 1214 |