Publication Information

Title: Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride

Type: Journal

Info: ACS Appl. Mater. Interfaces, 2014, 6 (13), pp 10534-1054

Date: 2014-06-10

DOI: http://dx.doi.org/10.1021/am5021167

Author Information

Name

Institution

Tyndall National Institute, University College Cork

Films

Plasma SiO2 using Unknown

Deposition Temperature Range N/A

Plasma SiNx using Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

FTIR, Fourier Transform InfraRed spectroscopy

Unknown

Substrates

Keywords

Density Functional Theory (DFT)

Modeling

Notes

247

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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