Publication Information

Title: Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks

Type: Journal

Info: Semicond. Sci. Technol. 25 (2010) 045009

Date: 2010-02-23

DOI: http://dx.doi.org/10.1088/0268-1242/25/4/045009

Author Information

Name

Institution

Fraunhofer Institute for Integrated Systems and Device Technology (IISB)

Fraunhofer Institute for Integrated Systems and Device Technology (IISB)

Ruhr-University Bochum

Ruhr-University Bochum

Fraunhofer Institute for Integrated Systems and Device Technology (IISB)

Films

Plasma NbN using Unknown

Deposition Temperature Range N/A

0-0-0

Unknown

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Chemical Composition, Impurities

SNMS, Seconday Neutral Mass Spectrometry

Unknown

EOT, Equivalent Oxide Thickness

C-V, Capacitance-Voltage Measurements

Unknown

Flat Band Voltage

C-V, Capacitance-Voltage Measurements

Unknown

Work Function

C-V, Capacitance-Voltage Measurements

Unknown

Fixed Charge

C-V, Capacitance-Voltage Measurements

Unknown

Interface Trap Density

C-V, Capacitance-Voltage Measurements

Unknown

Hysteresis

C-V, Capacitance-Voltage Measurements

Unknown

Work Function

I-V, Current-Voltage Measurements

Unknown

Breakdown Voltage

I-V, Current-Voltage Measurements

Unknown

Leakage Current

I-V, Current-Voltage Measurements

Unknown

Substrates

SiO2

HfO2

Keywords

Gate Metal

Notes

Some samples RTP at 900C for 30s.

Plasma gas not mentioned. Might be in companion paper http://dx.doi.org/10.1088/0268-1242/25/7/075009.

60

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