Publication Information

Title: Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition

Type: Journal

Info: Chem. Mater. 2015, 27, 148-156

Date: 2014-12-04

DOI: http://dx.doi.org/10.1021/cm503659d

Author Information

Name

Institution

Yonsei University

Films

Deposition Temperature Range = 150-300C

0-0-0

7782-44-7

Deposition Temperature Range = 130-330C

0-0-0

7732-18-5

Deposition Temperature Range = 140-330C

0-0-0

7782-44-7

Deposition Temperature Range N/A

0-0-0

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

234

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