Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Hieu T. Nguyen Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hieu T. Nguyen returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation