Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Jeffrey Shallenberger Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jeffrey Shallenberger returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
2Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition