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DiMethoxyDiMethylSilane DMDMS, (CH3)2(OCH3)2Si, CAS# 1112-39-6

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition


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