4DMASi, TDMASi, (Me2N)4Si, [(CH3)2N]4Si, Tetrakis(DiMethylAmido) Silane, Silicon Dimethylamide, CAS# 1624-01-7
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Plasma Enhanced Atomic Layer Deposition Film Publications
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|1||Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition|