Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Y(iPrCp)3, Yttrium tris(isopropylcyclopentadienyl), CAS# 130206-63-2

Where to buy

NumberVendorRegionLink
1Yoodatech (Shanghai) Co., LtdY(iPrCp)3, Yttrium tris(isopropylcyclopentadienyl) - contact maggie@yoodatech.com
2Ereztech🇺🇸Tris(i-propylcyclopentadienyl)yttrium(III)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection