The publication database currently has 1636 entries.
203 Films Compositions
274 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics
91 Theses
5041 Authors
Use Advanced Search for more complex searches
Recent Database Additions
Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
Electron-enhanced atomic layer deposition of silicon thin films at room temperature
Search 1636 plasma ALD publications by:
Search 1636 plasma ALD publications by:
Y(iPrCp)3, Yttrium tris(isopropylcyclopentadienyl), CAS# 130206-63-2
Where to buy
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | Ereztech | 🇺🇸 | Tris(i-propylcyclopentadienyl)yttrium(III) |
www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.
If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|---|
| 1 | Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection |