TADS, 1,1,1-tris(dimethylamino)disilane, [(H3C)2N]3Si2H3, CAS# 2273763-87-2
Plasma Enhanced Atomic Layer Deposition Film Publications
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| Number | Title |
|---|---|
| 1 | High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane |