TetraIsoButyl Germanium, TIBGe, Ge(i-C4H9)4, CAS# 0-0-0
Plasma Enhanced Atomic Layer Deposition Film Publications
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| Number | Title |
|---|---|
| 1 | Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition |