Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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(MeCp)W(CO)2(NO), methylcyclopentadienyl dicarbonyl nitrosyl tungsten, CAS# 0-0-0

Where to buy

NumberVendorRegionLink
1Ereztech🇺🇸(n5-methylcyclopentadienyl) dicarbonylnitrosyl tungsten

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier