The publication database currently has 1636 entries.
203 Films Compositions
274 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics
91 Theses
5041 Authors
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Recent Database Additions
Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
Electron-enhanced atomic layer deposition of silicon thin films at room temperature
Search 1636 plasma ALD publications by:
Search 1636 plasma ALD publications by:
TDEATi, (Et2N)4Ti, [(C2H5)2N]4Ti, Tetrakis(DiEthylAmido) Titanium, Titanium Diethylamide, CAS# 4419-47-0
Where to buy
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | Gelest | 🇺🇸 | Titanium Tetrakis(Diethylamide), 99+% |
| 2 | Strem Chemicals, Inc. | 🇺🇸 | Tetrakis(diethylamino)titanium(IV), 99%, 22-1050, contained in 50 ml cylinder (96-1070) for CVD/ALD |
| 3 | Strem Chemicals, Inc. | 🇺🇸 | Tetrakis(diethylamino)titanium(IV), 99% |
| 4 | EpiValence | 🇬🇧 | Titanium diethylamide |
| 5 | Ereztech | 🇺🇸 | Tetrakis(diethylamino) titanium(IV) |
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Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|---|
| 1 | Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme |