The publication database currently has 1509 entries.
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188 Films Compositions
401 Precursors and Plasma Gases
73 Deposition Hardwares
238 Film and Plasma Characteristics
79 Theses
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Recent Database Additions
Carbon content control of silicon oxycarbide film with methane containing plasma
Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
Search 1509 plasma ALD publications by:
Search 1509 plasma ALD publications by:
TDEATi, (Et2N)4Ti, [(C2H5)2N]4Ti, Tetrakis(DiEthylAmido) Titanium, Titanium Diethylamide, CAS# 4419-47-0
Where to buy
| Number | Vendor | Link |
|---|---|---|
| 1 | Ereztech | Tetrakis(diethylamino)titanium |
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|---|
| 1 | Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |