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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
TDEATi, (Et2N)4Ti, [(C2H5)2N]4Ti, Tetrakis(DiEthylAmido) Titanium, Titanium Diethylamide, CAS# 4419-47-0
Where to buy
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | Strem Chemicals, Inc. | 🇺🇸 | Tetrakis(diethylamino)titanium(IV), 99%, 22-1050, contained in 50 ml cylinder (96-1070) for CVD/ALD |
| 2 | Ereztech | 🇺🇸 | Tetrakis(diethylamino) titanium(IV) |
| 3 | Gelest | 🇺🇸 | Titanium Tetrakis(Diethylamide), 99+% |
| 4 | Strem Chemicals, Inc. | 🇺🇸 | Tetrakis(diethylamino)titanium(IV), 99% |
| 5 | EpiValence | 🇬🇧 | Titanium diethylamide |
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Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|---|
| 1 | Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme |