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TBTDEN, Tris(diethylamido)(tert-butylimido)niobium, CAS# 210363-27-2

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1NbNAtomic Layer Deposition of Niobium Nitride from Different Precursors
2NbNPlasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
3NbNPlasma-enhanced atomic layer deposition of superconducting niobium nitride
4NbNSuperconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
5NbNSuperconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
6NbNSuperconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
7NbTiNSuperconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition


I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at:


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