bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

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1Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex


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