Abacus, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Copper-ALD Seed Layer as an Enabler for Device Scaling
2PEALD of Copper using New Precursors for Next Generation of Interconnections
3Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD


I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

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