Self-limiting diamond growth from alternating CFx and H fluxes

Type:
Journal
Info:
Diamond and Related Materials 7 (1998) 1087-1094
Date:
1997-12-10

Author Information

Name Institution
S.F. KomarovRensselaer Polytechnic Institute (RPI)
J.-J. LeeRensselaer Polytechnic Institute (RPI)
J.B. HudsonRensselaer Polytechnic Institute (RPI)
M.P. D'EvelynRensselaer Polytechnic Institute (RPI)

Films

Plasma Diamond


Film/Plasma Properties

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Substrates

Mo
Diamond

Notes

1689